top of page

Our joint work with Prof Bode was published in Helvetica Chimica Acta

Bode先生(ITbM)との共同研究成果がHelvetica Chimica Acta 誌に論文が掲載されました。

Post-assembly Photomasking of Potassium Acyltrifluoroborates (KAT) for Two-Photon 3D Patterning of PEG-Hydrogels

Haewon Song, Dino Wu, Dimitry Mazunin, Sizhou M. Liu, Yoshikatsu Sato, Nicolas Broguiere, Marcy Zenobi‐Wong, Jeffrey W. Bode*

Helvetia Chimica Acta (2020)


bottom of page